Catalytic Oxidation of Acetone by Copper

The Bent Lab in Stanford’s Chemical Engineering Department focuses on studying the selective deposition of thin films in atomic layer deposition (ALD). These films are important for diffusion barriers, in integrated circuits. ALD is a subclass of chemical vapour deposition. My work focuses on selective etch processes whereby, we attempt to remove defects by etching the native oxide of tcopper. In this process we worked with c IsoPropanol, Acetone, Methanol, Ethanol, etc, with a goal of the reduction of CuxO. The process was optimized by using different heating conditions, temperatures and the time for the etch process. Sonication was also used in the etching process. Aspects of this process will be taught/transferred by applying the concepts of Redox Chemistry. Students will learn how to write a balanced formula and calculate percent yield in a chemical reaction. The ETP includes the Catalytic Oxidation of Acetone by Copper lab. Students have the opportunity to understand REDOX and visualize the chemistry behind thin films used in semiconductor device fabrication. Exposing students to how the complex device fabrication process involves the work the Bent Lab does on these films with a goal of smaller, faster, more energy efficient, and more sustainable.